•       Dedicated chemical pre-treatment sequences for subsequent deposition processes

•       Matched throughput and substrate condition to GENERIS PVD machine platforms and other post processes

•       Compatible for different substrates sizes and materials

•       Intelligent rinse cascading for low OPEX costs

•       High uptime with maintenance friendly access to installation area

•       Advanced process control by onboard data tracking

•       Wide range of optional features like ultrasonic, ozone treatment and furthers